| Model | Range | Wavelength | Response Time (1) | Accuracy (2) |
|---|---|---|---|---|
| General purpose, metals, glass, refractories | ||||
| M1 450/1000C | 450 to 1000 °c | 1㎛ | 5ms | 0.4%k |
| M1 850/1850C | 850 to 1850 °c | 1㎛ | 5ms | 0.4%k |
| M1 600/1600C | 600 to 1600 °c | 1㎛ | 5ms | 0.4%k |
| M1 1100/2900C | 1100 to 2900 °c | 1㎛ | 5ms | 0.4%k |
| M1 800/2600C | 800 to 2600 °c | 1㎛ | 5ms | 0.7%k |
| M1 1500/4700C | 1500 to 4700 °c | 1㎛ | 5ms | 0.7%k |
| General purpose, metals and glass processing | ||||
| M2 300/1100C | 300 to 1100 °c | 1.6㎛ | 5ms | 0.25%k+K |
| M2600/2000F | 600 to 2000 °c | 1.6㎛ | 5ms | 0.25%k+K |
| Bright oxidised or lightly oxidised metal surfaces | ||||
| M4 50/250C | 50 to 250 °c | 2.4㎛ | 100ms | 3k |
| M4 50/250C | 150 to 500 °c | 2.4㎛ | 100ms | 3k |
| M4 50/250C | 150 to 550 °c | 2.4㎛ | 100ms | 4k |
| M4 50/250C | 300 to 1000 °c | 2.4㎛ | 100ms | 4k |
| Glass surface temperature measurement | ||||
| M5 400/1300C | 400 to 1300 °c | 4.8 to 5.2㎛ | 100ms | 0.6%k |
| M5 750/2400C | 750 to 2400 °c | 4.8 to 5.2㎛ | 100ms | 0.6%k |
| M5 1000/2500C | 1000 to 2500 °c | 4.8 to 5.2㎛ | 100ms | 0.6%k |
| M5 1800/4500C | 1800 to 4500 °c | 4.8 to 5.2㎛ | 100ms | 0.6%k |
| Glass purpose, low temperature, metals, glass, food, paper and textiles | ||||
| M6 0/300C | 0 to 300 °c | 3 to 5 ㎛ | 100ms | 0.3%k+2.5K |
| M6 50/600F | 50 to 600 °F | 3 to 5 ㎛ | 100ms | 0.3%k+2.5K |
| M6 100/700C | 100 to 700 °c | 3 to 5 ㎛ | 100ms | 0.3%k+2K |
| M6 200/1300F | 200 to 1300 °F | 3 to 5 ㎛ | 100ms | 0.3%k+2K |
| Plastic thin film | ||||
| M7 25/375C | 245 to 375 °F | 3.43 ㎛ | 100ms | 3K |
| M7 75/700F | 75 to 700 °F | 3.43 ㎛ | 100ms | 3K |
| Food, textiles, paper, plastics, rubber, wood,paint and ceramics | ||||
| M8 0/1000C | 0 to 1000 °c | 8 to 14 ㎛ | 100ms | 1%k+1K |
| M8 30/1830F | 30 to 1830 °c | 8 to 14 ㎛ | 100ms | 1%k+1K |
| Ratio thermometer, variable emissivity, target obscuration, partially filled field of view | ||||
| R1 600/1600C | 600 to 1600 °c | 0.85 to 1.1 ㎛ | 100ms | 0.65%k |
| R1 1100/2900F | 1100 to 2900 °F | 0.85 to 1.1 ㎛ | 100ms | 0.65%k |
| R1 1000/2600C | 1000 to 2600 °c | 0.85 to 1.1 ㎛ | 100ms | 1.1%K |
| R1 1800/4700F | 1800 to 4700 °F | 0.85 to 1.1 ㎛ | 100ms | 1.1%K |
| Metal Production | Smelting, refining, pouring, continuous casting, slabbing, reheating, rolling, drawing, coiling, extruding, coating, annealing, stamping, pressing, forging, sintering, galvanizing, heat treatment… |
|---|---|
| Glass Production | Melting, refining, firing, gob formation, furnaces, floating, molding, tempering, laminating, fiber drawing, vapor deposition, preforming... |
| Mineral Processing | Firing, mixing, drying, storing, conveying, laying... |
| Paper | Rolling, drying, calendering, coating, printing, photographic, curing... |
| Rubber | Mixing, calendering, extruding, thermoforming, molding, shrinking, laminating, blown film.. |
| Chemical | Catalyst beds, powder drying, mixing, furnaces, thermal reactors... |
| Food & Pharmaceuticals | Freezing, molding, extrusion, sterilizing, tablet drying, labelling, sealing... |
| Electronics | Wave soldering, glass coating,circuit board testing, doping.... |
